SMART Chart Webinar Series: TXRF
Total Reflection X-ray Fluorescence (TXRF)
Presented: Thursday, September 10, 2020
Let's take a deeper dive into our SMART Chart!
Our upcoming webinar in this series will be focused on Total Reflection X-ray Fluorescence (TXRF).
TXRF is a non-destructive elemental survey technique utilized for quantifying trace level surface contamination of semiconductor wafers and thin films. TXRF is a form of energy dispersive XRF that uses a very shallow incident angle (typically less than 0.05°) to probe only the top ~50Å of a smooth reflective surface. The technique utilizes multiple X-ray excitation sources of different energies to quantify a wide range of elements stretching from Na to U. With a 1 cm analytical spot, one of the greatest strengths of TXRF is the ability map the spatial distribution of contaminants across the full surface of a wafer.
Please view all of our webinars here.
About the Presenter:
William R. Woerner, Ph.D., Senior Scientist
With over a decade of experience utilizing X-ray techniques to characterize a wide array of materials, Bill is celebrating his fifth year at EAG in Sunnyvale, CA, where he specializes in TXRF, XRD, and XRR analysis. He earned his Ph.D. in Geosciences from Stony Brook University studying semiconductors, minerals, and gas adsorption in microporous materials.
This webinar aims to give an overview of the fundamentals of TXRF as it pertains to the semiconductor world and demonstrates how we utilize the technique to characterize substrates and thin films at EAG.
In this webinar we will cover:
- The fundamentals of TXRF
- Sample requirements
- Types of analysis
- Common uses and examples using typical samples
- Strengths and limitations