SMART Chart Webinar Series: XRF
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X-ray Fluorescence Spectroscopy (XRF) is a powerful analytical technique that is routinely used for quantitative elemental analysis of a wide range of materials, including liquids and practically any solid (ceramic, glass, polymer, alloy, etc.). The wide dynamic range allows for both trace element and matrix compositional analysis in the same measurement. Wavelength Dispersive XRF (WDXRF) has unrivaled precision, and when appropriate standards are available for calibration the relative accuracy makes the technique indispensable for QC applications where the highest degree of accuracy is required. While XRF is commonly considered to be a bulk analysis technique it is also used to nondestructively measure the thickness and compositions of thin films, including multilayer films.
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About the Presenter:
Greg Strossman, Ph.D., Scientific Fellow
Greg Strossman joined Charles Evans & Associates, now EAG, in 1994. He has over 25 years of experience in materials characterization with a variety of analytical techniques for semiconductor and non-semiconductor applications, including XRF, XPS, TOF-SIMS, and FTIR. He has been an instructor for the EAG technical seminar (Working Smarter) for many years and has co-authored a chapter on physical and chemical characterization of semiconductor materials for a book published by the CRC Press.
This webinar will describe fundamental principles of XRF along with a diverse set of examples to provide you with firm understanding of its broad applicability as a materials characterization tool.
In this webinar we will cover:
- Principles of the technique
- Common uses
- Sample requirements
- Several real-world examples demonstrating
- Bulk composition measurements
- Trace analysis
- Thin film characterization, including full wafer analysis
- Strengths and limitations